Altrika Ltd uses a high-throughput Physical Vapour Deposition facility (HT-PVD) that can deposit large numbers of films of different composition in one experimental run. This facility is operated under UHV conditions and utilises a variety of sources for simultaneous multi-element (up to six) deposition onto unique substrate arrays (targets). Patented technology ensures that the deposition of all elements occurs simultaneously and that the composition profile can be carefully varied across the substrate in a controlled manner.

The composition and structure of a particular material composition can be confirmed in-situ using a variety of automated analytical techniques so that we can characterise and map the nature of the materials generated. In addition, a number of unique substrates have been developed which allow all material compositions to be screened for particular required properties. These include:

 

Composition / structure:

SEM, EDS, XRD, AFM, TEM, Raman

Conductivity:

4-point probe, Van de Pauw

Optical:

Ellipsometer

Thermal:

IR Thermal Camera

Thickness:

Profilometer, AFM

Phase Change:

IR Thermal Camera, Differential Scanning Calorimetry

Electrochemistry:

CV, Potential Step, Rotating Disc Studies